2008년 7월 15일 화요일

PRS (Pattern Removal System)

1. Outline
PRS is a recycling system using continuous surface processing technology. SILFINE sorts rejected wafers which were collected during semiconductor manufacturing process for various reasons.
In order to protect the intellectual property of our clients, such as circuits and patterns on wafers, SILFINE introduced a mechanical process to eliminate any environmentally-contaminating substances from discharge during operation.


2. The Characteristics and Strengths of PRS Technology
(1) Protects intellectual properties of the client
→ Provide mobile service
(2) Maximization of production efficiency
→ Continuous treatment system
(3) Prevention of pollution occurrence
→ Introduction of physical pattern removal technology
(4) Customer satisfaction quality assurance in operation
→ Enabled assortment and inspection according to quality level, then delivery according to customer specifications
(5) Environment-friendly recycling system
→ Used as solar energy material after treatment

3. Properties
* Material : Silicon
* Crystallization Shape : Mono crystal
* Type and resistance
P > 0.5 ohm
N > 1.0 ohm

4. Product Application
--> Original material of ingot for solar use

5. WORK FLOW
- Waste wafer
- Testing and separation
- Surface treatment
- Inspection
- Packaging

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Address : 374-2, Shinsuri, Eumbongmyeon, AsanCity, Chungnam, 336-862, KOREA.
Tel +82 (0)41 552 5200 Fax +82 (0)41 552 5300 / http://www.silfine.com e-mail : info@silfine.com

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